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Run-to-Run Process Control: Literature Review and Extensions

Summary: In the last few years, "Run-to-Run" (R2R) control techniques have been developed and used to control various semiconductor manufacturing processes. These techniques combine response surface, statistical process control, and feedback control techniques. This paper provides a literature review of R2R control methods from a statistical and control engineering point of view. It is shown that self-tuning controllers can provide a valuable control strategy for R2R applications. In this paper we address the single-input-single-output (SISO) case. Two proposed self-tuning controllers compensate not only for the standard case response (i.e., in case there exist process dynamics). In order to reduce the input variance, a control chart is added to the output and acts as a deadband.

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  • Topics: Statistical Process Control (SPC)
  • Keywords: Statistical process control (SPC),Feedback control
  • Author: Del Castillo, Enrique; Hurwitz, Arnon M.
  • Journal: Journal of Quality Technology