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An Autologistic Model for Integrated Circuit Manufacturing

Summary: [This abstract is based on the author's abstract. A longer abstract is available on the journal's website.]

Spatial dependence is often found among data from integrated circuit manufacturing. Assuming nearest neighbor dependence among binary responses leads to an autologistic model, which enables the estimation of yield and spatial dependence simultaneously. A two-stage estimation procedure is proposed for probe data from designed experiments. The proposed method is compared with other recent approaches. Two examples from the integrated circuit (IC) industry are used to illustrate the two-stage methodology.

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  • Topics: Design of Experiments
  • Keywords: Design,Design for manufacturability (DFM),Design of experiments (DOE),Estimation,Regression,Regression analysis
  • Author: Ramirez, Jose; Taam, Winson
  • Journal: Journal of Quality Technology